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EEC249 – Nanofabrication

3 units – Spring Quarter; alternate years, odd years

Lecture: 3 hours

Prerequisite: Graduate Standing in Engineering

Grading: Letter; homework (20%), term paper and presentation (30%), midterm exam (20%), final exam (30%).

Catalog Description:

Theory and practices of nanofabrication for producting electronic devices, optoelectionics, sensors, MEMS, Nanostructures, Photonic Crystals, Single-Electron Transistors, Resonators, Phase-Change and Smart Materials. Study of electron-, photon-, and ion-beams and their interactions with solids. Characterization methods and physical limits are examined.

Expanded Course Description:

To provide a rigorous understanding of the theory of nanofabrication processes. Intended to complement the practical education provided by EEC146A/B and EEC246.

  1. Energetic Sources from Electrons, Ions, and Photons (4 lectures)
    1. Electron Sources, Optics, and Interactions
    2. Ion Sources, Optics, and Interactions. Ion Implantation.
    3. Photon Sources, X-Rays, Optics, and Interactions
  2. Plasma Processes (5 lectures)
    1. Vacuum Science
    2. Plasma Basics, Chemistry, Glow
    3. Isotropic and reactive ion etching
    4. Ion milling, focused ion beam (FIB), Chemically-Assisted ion beam etch
  3. Sputter Deposition (4 lectures)
    1. targets, substrates, and systems for deposition
    2. Sputtering gas
    3. Rates, sputter yields and uniformity
    4. Comparison with other physical deposition technologies (e.g., evaporation, SOL-GEL, etc.)
  4. Chemical Vapor Deposition (6 lectures)
    1. CVD methods and systems
    2. Epitaxy
    3. Vapor-Liquid-Solid (VLS) Growth
    4. Depostioin of various materials (insulators, semiconductors, conductors)
    5. Organometallic VPE and Molecular Beam Epitaxy (MBE)
  5. Pattering (4 lectures)
    1. Extreme UV Methods
    2. E-Beam and Ion-Beam Lithography
    3. Direct-Write Methods
  6. Characterization Technology (4 lectures)
    1. Imaging Microscopy, SEM and TEM
    2. Analytical Microscopy (EDX, SNFOR)
    3. Raman and FTIR
    4. Rutherford Backscattering and Channeling
    5. Auger and XPS
    6. SIMS and SNMS
  7. Fundamental Limits to Feature Definition (3 Lectures)
    1. Quantum Physical Limits
    2. Materials Limits
    3. Device, Circuit and System Limits


  1. The Physics of Micro/NanoFabrication, by I. Brodie and J. Muray, 2nd Ed., Plenum Press.
  2. Various reviews from the literature
  3. Notes provided by the Instructor

Instructors: Hunt, Islam