The following is a partial list of the lab equipment we have.
Material Growth and Characterization Tools
CVD Reactor : A fully automated Chemical Vapor Deposition System with 16 gases for group IV and III-V nanostructure Growth
MTI Bench-Top High Temperature Tubing Vacuum Furnace
MTI Bench-Top High Temperature Tubing Vacuum Furnace: Used for SnO2, ZnO and In2O3 nanowire growth.
Micromanipulator Probe Station
Another Probe-Station. Both of these stations are used for our nanowire and molecular electronic devices characterizations.
Keithley 236 Source Measurement Unit
Keithley 236 Source Measurement Unit with Agilent E3649A Dual-Output DC Power supply
HP 8165A Programmable Signal Generator
HP 8165A Programmable Signal Generator, Agilent 34401A Digital Multimeter, and Agilent 33120A 15MHz Arbitrary Waveform Generator