August 15, 2014
University of California, Davis has been awarded a thin film deposition instrument to use as a shared resource for conducting fundamental research on materials, processes, and devices for a wide spectrum of important applications. Initiated by the proposal “MRI: Acquisition of a Plasma Enhanced Chemical Vapor Deposition (PECVD) Tool with Inductively Coupled Plasma (ICP),” the proposed instrument is capable of producing high quality, highly conformal thin films (such as diamond or silica) on nano to macroscale structures with controlled thickness and material properties at less than 200°C temperature. Large numbers of students at UC Davis, Northern California high schools and community colleges, including many students from minority and underrepresented communities, as well as postdoctoral researchers, will have the opportunity to be educated in the immersive transdisciplinary environment surrounding this tool, uniquely preparing them to solve important problems and succeed in today’s highly competitive academic or industrial environments. The awarded proposal is under the collaborative direction of Saif Islam, X. Leo Liu, Neville Luhmann, Subhash Mahajan, David A. Horsley, Jerry Woodall, Erkin ?eker, Q. Jane Gu, Joshua Hihath, Cristina Davis and Dong Yu.